Asahi Kasei to Double PIMEL™ Production by 2030
- Asahi Kasei will invest ¥16 billion to double PIMEL™ production capacity by 2030.
- The expansion is in response to an 8% annual growth in semiconductor demand.
- A new PIMEL™ plant was completed in Fuji City in December 2024.
Expansion Plans
Asahi Kasei plans to double its production capacity for PIMEL™ photosensitive polyimide (PSPI) at its Fuji City facility in Shizuoka Prefecture, Japan, by 2030. This expansion is driven by the growing demand for semiconductor materials, with the company investing approximately ¥16 billion in the project.
Market Demand
The global semiconductor industry is entering a new growth cycle, projected to surpass US$1 trillion in revenue by the mid-2030s. Asahi Kasei forecasts an average annual growth rate of 8% for next-generation semiconductor interlayer insulation, prompting the need for increased production capacity.
Production Facility
In December 2024, Asahi Kasei completed the construction of a new plant for PIMEL™ production in Fuji City. The decision to further expand production capacity at this site underscores the company's commitment to meeting the rising demand for essential semiconductor materials.
Applications of PIMEL™
PIMEL™ is used in various semiconductor applications, including buffer coatings and passivation layers, which protect semiconductor devices from mechanical stress and contamination. It also plays a role in redistribution layers (RDL), optimizing electrical connections and enabling high-density circuit designs. These attributes make PIMEL™ a crucial component in the global semiconductor supply chain and the development of next-generation technologies like generative AI.
Source: Asahi Kasei