- Toray poised to start mass production of STF-1000 in 2026 after shipping samples to customers in 2025.
- STF-1000 achieves a 36:1 aspect ratio for patterns in films up to 500 µm thick.
- Toray's negative-tone polymer design suppresses distortion and cracking that previously occurred in films thicker than 200 µm.
- Toray developed STF-2000 in 2025 as a PFAS-free photosensitive polyimide for electronic components and microfluidic devices.
Product and production
Toray will begin mass production of STF-1000 photosensitive polyimide after shipping samples to customers in 2025 for evaluation.
Performance
STF-1000 enables high-aspect-ratio patterning of 36:1 in films up to 500 µm thick, supporting microstructures that are narrow and tall.
Technical advance and recognition
The negative-tone polymer design suppresses pattern distortion, cracking and delamination that previously occurred in films thicker than 200 µm; Toray received The Chemical Society of Japan Award for Young Chemists in Technical Development (2025) for this work.
Applications and related products
Applications include electronic components, MEMS, semiconductor vias, microfluidic devices and scintillator panels for X-ray non-destructive testing; Toray also developed STF-2000 in 2025, a PFAS-free photosensitive polyimide aimed at electronics and microfluidic use.
